| 发明名称 |
Chemical processing method, and method of manufacturing semiconductor device |
| 摘要 |
Air trapped in a blind hole during processing of the blind hole with a liquid is eliminated by circulating the liquid along a surface-to-be-processed in substantially a single direction at all times and by setting a velocity gradient of the liquid over the surface to at least 300/second.
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| 申请公布号 |
US6992016(B2) |
申请公布日期 |
2006.01.31 |
| 申请号 |
US20040000978 |
申请日期 |
2004.12.02 |
| 申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
NAKAMOTO TAKEO;KOSAKI KATSUYA;KINUGAWA MASARU |
| 分类号 |
C23C18/16;H01L21/302;C23C18/31;C23F1/00;C25D7/12;H01L21/00;H01L21/288;H01L21/304;H01L21/306;H01L21/768;H01L29/06;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109 |
主分类号 |
C23C18/16 |
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