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发明名称
METHOD FOR FORMING INTERLAYER DIELECTRIC FILM
摘要
申请公布号
KR20060007713(A)
申请公布日期
2006.01.26
申请号
KR20040056940
申请日期
2004.07.21
申请人
HYNIX SEMICONDUCTOR INC.
发明人
KWON, HYUK
分类号
H01L21/314
主分类号
H01L21/314
代理机构
代理人
主权项
地址
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