Apparatus for forming thin film on substrate, has chamber with gas inlet, upper electrode, lower electrode, and selective injection plate including selective injection valve for selectively concentrating gas

摘要

A forming apparatus for forming a thin film on a substrate comprises: a chamber having a gas inlet; an upper electrode having nozzles; a lower electrode for supporting the substrate, and spaced apart from the upper electrode; and a selective injection plate above the upper electrode. The injection plate includes a selective injection valve for selectively concentrating a gas supplied through the gas inlet onto a portion of the upper electrode. Apparatus (50) for forming a thin film on a substrate (64) comprises: a chamber (52) having a gas inlet (54); an upper electrode (58) in the chamber and having nozzles (60); a lower electrode (62) in the chamber for supporting the substrate, and being spaced apart from the upper electrode; and a selective injection plate (70) above the upper electrode. The injection plate includes a selective injection valve (76) for selectively concentrating a gas supplied through the gas inlet onto a portion of the upper electrode. An independent claim is also included for: (a) a method for forming a thin film on a substrate by: supplying the gas into the chamber; selectively moving the selective injection valve of the selective injection plate in the chamber; channeling the gas through the selective injection plate; selectively concentrating the gas onto the portion of the upper electrode inside the chamber using the selective injection valve; and injecting the gas across the substrate supported by the lower electrode at a varying gas injection rate across the surface of the substrate; and (b) a liquid crystal display device comprising: a first substrate; a second substrate, where one of the first and second substrates has the thin film formed by the above forming apparatus; and a liquid crystal layer between the first and second substrates.