发明名称 Exposure system
摘要 An exposure system includes a plurality of kinds of light emitting element arrays, each formed of a plurality of light emitting elements which are arranged in one row in one direction, which are arranged substantially normal to said one direction and emits light in different wavelength ranges, and a sub-scanning mechanism which holds a color photosensitive material in a position where the light from each of the light emitting element arrays is projected, and moves the color photosensitive material and the light emitting element arrays relatively to each other in the one direction. In the exposure system at least one of the plurality of kinds of light emitting element arrays is a multi-layered type light emitting element array or the light emitting area of the light emitting element is nonuniform between at least two kinds of light emitting element arrays.
申请公布号 US2006017800(A1) 申请公布日期 2006.01.26
申请号 US20050187951 申请日期 2005.07.25
申请人 FUJI PHOTO FILM CO., LTD. 发明人 HYUGA HIROAKI
分类号 B41J2/45 主分类号 B41J2/45
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