发明名称 Substrate transfer device and cleaning method thereof and substrate processing system and cleaning method thereof
摘要 A substrate transfer device includes an accommodating chamber for accommodating a substrate; a substrate transfer unit installed in the accommodating chamber for transferring the substrate; a gas exhaust unit for exhausting the accommodating chamber; and a gas introducing unit for introducing a gas into the accommodating chamber. The substrate transfer unit has a mounting subunit for mounting the substrate thereon, an arm subunit one end of which is connected to the mounting subunit to move the mounting subunit, and an electrode installed in the mounting subunit to which a voltage is applied, and a high voltage is applied to the electrode while the gas is being introduced into the accommodating chamber and the accommodating chamber is being exhausted.
申请公布号 US2006011213(A1) 申请公布日期 2006.01.19
申请号 US20050115357 申请日期 2005.04.27
申请人 TOKYO ELECTRON LIMITED 发明人 MORIYA TSUYOSHI;NAKAYAMA HIROYUKI
分类号 B08B6/00;B08B9/00 主分类号 B08B6/00
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