| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a writing method by which the outgoing of an electron beam can be turned on/off at high speed, or the dimension of a variable formation beam or the character of a character mask can be changed at high speed. <P>SOLUTION: An electron beam discharged from a thermionic emission cathode 1 is accelerated, and it is directed into a square opening 4 to form it into a square shape. The formed square electron beam is patterned by passing it through a character mask 9, and the patterned electron beam is selectively emitted. The patterned electron beam is contracted, positioned and focused by an objective lens 12, and it is given onto a wafer 27. The patterned electron beam is further accelerated between the objective lens 12 and the wafer 27, thereby giving such an energy to the electron beam that can transmit a resist. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
