| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for preventing or substantially decreasing damages on a lens by contaminant. <P>SOLUTION: A projection system 108 comprises an array of lenses located at a spacing from a substrate 114 such that each lens in the array focuses a respective part of a patterned beam onto the substrate 114. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus, damage to the lens array as a result of, for example, scratching by particles on the substrate surface can be avoided. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
