发明名称 |
METHOD FOR EVALUATING RESIST COMPOSITION USING DIPPING SOLVENT |
摘要 |
A resist composition for use in an immersion lithography process which satisfies a specific parameter; a positive resist composition which comprises a resin component (A) having a dissolution-suppressing group being dissociated by an acid and thus exhibiting enhanced solubility in an alkali by the action of an acid, an acid generating component (B) and an organic solvent (C), wherein the (A) component (a1) has a constituting unit derived from a (meth)acrylate ester having a dissolution-suppressing group being dissociated by an acid and (a0) has no organic constituting unit (a0-1) containing an anhydride of a dicarboxylic acid and no organic constituting unit (a0-2) containing a phenolic hydroxyl group; and a method for forming a resist pattern which comprises using the above resist composition. The resist composition is resistant to a solvent used in an immersion lithography process, and also is excellent in sensitivity and in the form of a resist pattern profile. |
申请公布号 |
KR20060006101(A) |
申请公布日期 |
2006.01.18 |
申请号 |
KR20057023108 |
申请日期 |
2005.12.02 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HIRAYAMA TAKU;HADA HIDEO;FUJIMURA SATOSHI;IWAI TAKESHI;SATO MITSURU;TAKASU RYOICHI;TACHIKAWA TOSHIKAZU;IWASHITA JUN;ISHIDUKA KEITA;YAMADA TOMOTAKA;TAKAYAMA TOSHIKAZU;YOSHIDA MASAAKI |
分类号 |
G03F7/26;G03C1/76;G03F7/004;G03F7/038;G03F7/039;G03F7/20;H01L21/027 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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