发明名称 METHOD AND APPARATUS FOR TREATING ORGANOSILOXANE COATING FILM
摘要 A method for treating an organosiloxane coating film which has a first process of transporting a substrate (W) provided with a coating film of a chemical fluid based on a polysiloxane havng an organic functional group into a reaction chamber (2), and a second process of subjecting the substrate (W) to the heat treatment in the reaction chamber (2) to heat the coating film, wherein the second process comprises a temperature setting step of heating the inside of the reaction chamber (2) to a treatment temperature, and a supply step of supplying a heating gas to the reaction chamber (2) having the treatment temperature, while activating the heating gas in a gas activation section (14).
申请公布号 KR20060004644(A) 申请公布日期 2006.01.12
申请号 KR20057000623 申请日期 2004.04.20
申请人 TOKYO ELECTRON LIMITED 发明人 HISHIYA SHINGO
分类号 H01L21/31;H01L21/312;B05D3/04;H01L21/314;H01L21/316 主分类号 H01L21/31
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