| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a phase shift mask having a simple structure which requires neither recessed part on a substrate surface nor multilayer film structure and manufacturing steps of which are not increased, in the phase shift mask which inverts a phase difference between transmission light passing through a recessed part formed on a substrate surface and transmission light adjacent to it, and to provide a method for manufacturing the phase shift mask and a method for transferring a pattern. <P>SOLUTION: The phase shift mask has a refractive index varied portion in a transparent substrate, which generates 180° phase difference between transmission light passing through in the refractive index varied portion and transmission light passing through the transparent substrate. By the method for manufacturing a phase shift mask, the refractive index varied portion in the transparent substrate is formed by converging laser light into the position in the transparent substrate to induce laser ablation to produce a high-density portion or a hole. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
