| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which can reduce a down time of the exposure device by cleaning a reticle chuck surface automatically. <P>SOLUTION: A tool for cleaning a reticle chuck surface by using either a reticle carrying device or a reticle exchange device is carried, and the reticle chuck surface is cleaned by using the tool. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
