COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN USING SAME

摘要

Disclosed is a composition for antireflection coatings which has especially excellent application characteristics while maintaining performance as an antireflective film. Also disclosed is a method for forming a pattern using such a composition. Specifically disclosed is a composition for antireflection coatings which contains at least the following components (A), (B), (C), (D) and (E). (A) A perfluoroalkyl alkylenesulfonic acid represented by the following general formula (1): C_nF_2n+1(CH₂CH₂)_mSO₃H (In this formula, n represents an integer of 1-20 and m represents an integer of 0-20.) (B) An organic amine (C) A water-soluble polymer (D) A perfluoroalkylethyl group-containing compound represented by the following general formula (2): C_kF_2k+1CH₂CH₂-X-Y (In this formula, k represents an integer of 1-20; X represents a single bond or a divalent linking group; and Y represents an anionic group or a nonionic group. In addition, this compound has a structure different from that of the component (A).) (E) Water