CHEMICAL MECHANICAL POLISHING HEAD CLEANER AND METHOD OF CLEANING A CMP HEAD USING THE SAME,申请号KR20040051305-传众专利搜索

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发明名称	CHEMICAL MECHANICAL POLISHING HEAD CLEANER AND METHOD OF CLEANING A CMP HEAD USING THE SAME
摘要
申请公布号	KR20060002335(A)	申请公布日期	2006.01.09
申请号	KR20040051305	申请日期	2004.07.01
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	YANG, JAE HYUN;HWANG, JUNG SUNG;AHN, YO HAN;HWANG, TAE JIN;KIM, DONG YEON;PARK, KYOUNG HO
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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