发明名称 Method of separating layers of material
摘要 A lift off process is used to separate a layer of material from a substrate by irradiating an interface between the layer of material and the substrate. According to one exemplary process, the layer is separated into a plurality of sections corresponding to dies on the substrate and a homogeneous beam spot is shaped to cover an integer number of the sections.
申请公布号 US2006003553(A1) 申请公布日期 2006.01.05
申请号 US20050215248 申请日期 2005.08.30
申请人 发明人 PARK JONGKOOK;SERCEL JEFFREY P.;SERCEL PATRICK J.
分类号 H01L21/301;H01L21/268;H01L21/30;H01L21/46;H01L21/78;H01L29/22;H01L33/00 主分类号 H01L21/301
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