发明名称 APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce residual blow or prevent increase of blow marks by radiating a laser beam so that the direction of the electric field of the laser beam becomes parallel to the longitudinal direction of a fuse. <P>SOLUTION: Two lasers 6m and 6n whose electric fields are parallel to and vertical with respect to the longitudinal direction of a fuse are mounted, and both laser beams are to have the same axis by a polarizing beam splitter 10. The splitter 10 has such characteristics that it reflects almost 100% of the beam, when the direction of the electric field is vertical but will transmit almost 100%, when the electric field is horizontal, so that the beam Nm of the laser 6m is reflected and the beam Nn of the laser 6n is transmitted. Thus, the laser 6m, whose direction of the electric field is parallel to the longitudinal direction of a fuse can be radiated to the fuse; and when another fuse is placed so that its direction differs by 90 degrees, the beam Nn can be irradiated whose direction of the electric field is parallel to the longitudinal direction of the fuse. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006005346(A) 申请公布日期 2006.01.05
申请号 JP20050171803 申请日期 2005.06.13
申请人 MITSUBISHI ELECTRIC CORP 发明人 IWAMOTO TAKESHI;IDO YASUHIRO;TOYODA RUI
分类号 H01L21/82;B23K26/06;B23K26/38;B23K26/40;B23K101/40 主分类号 H01L21/82
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