发明名称 |
INLAID POLISHING PAD AND METHOD OF PRODUCING THE SAME |
摘要 |
A surface treatment or a two-step injection molding is used to make an inlaid polishing pad. A surface of the inlaid polishing pad has areas of different rigidity to control the rigidity and compressibility of the inlaid polishing pad. Furthermore, methods of making such an inlaid polishing pads are also disclosed.
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申请公布号 |
US2005287940(A1) |
申请公布日期 |
2005.12.29 |
申请号 |
US20050160568 |
申请日期 |
2005.06.29 |
申请人 |
IV TECHNOLOGIES CO., LTD. |
发明人 |
SHIH WEN-CHANG |
分类号 |
B24B1/00;B24B37/04;B24D13/14;B24D18/00;(IPC1-7):B24B1/00 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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