| 摘要 |
PROBLEM TO BE SOLVED: To prevent occurrences or the like of mask pattern defects by verifying what mask pattern is used by a final mask pattern. SOLUTION: The mask pattern verifying apparatus is provided with: a processing means for controlling operation to verify the mask pattern; a storage means for storing description files sorted by the cell kind to describe each parameter of a function cell and compiled cell prepared for a library of the mask pattern which is connected and checked by the processing means; and a display means for displaying a check result. The processing means is provided with: a means for reading the description files sorted by the cell kind stored in the storage means to decide whether it is a function cell or compiled cell; a means for recomposing the latest pattern on the basis of the parameter with respect to a cell decided to be a compiled one by the decision means; and a means for comparing the recomposed pattern with the mask pattern. COPYRIGHT: (C)2006,JPO&NCIPI
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