发明名称 |
METHOD OF OPERATING A PROCESSING SYSTEM FOR TREATING A SUBSTRATE |
摘要 |
<p>A method and system are described for operating a processing system in order to optimize throughput. The processing system is configured for chemical oxide removal, wherein the processing system includes a process chamber having a lower chamber portion configured to chemically treat a substrate and an upper chamber portion configured to thermally treat the substrate, and a substrate lifting assembly configured to transport the substrate between the lower chamber portion and the upper chamber portion.</p> |
申请公布号 |
WO2005122215(A1) |
申请公布日期 |
2005.12.22 |
申请号 |
WO2005US15928 |
申请日期 |
2005.05.06 |
申请人 |
TOKYO ELECTRON LIMITED;KENT, MARTIN |
发明人 |
KENT, MARTIN |
分类号 |
H01L21/00;H01L21/677;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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