发明名称 Overlay registration control system and method employing multiple pilot lot in-line overlay registration measurement
摘要 A method for fabricating a microelectronic product and a system for fabricating the microelectronic product each employ an in-line automatic photolithographic processing and overlay registration measurement for a pair of pilot lots of a new product order, prior to in-line automatic processing of an additional new product order lot within a photolithographic process tool. The method and the system provide for efficient production of new product order lots, absent need for an independent pilot lot qualification method or system.
申请公布号 US6978191(B2) 申请公布日期 2005.12.20
申请号 US20030656757 申请日期 2003.09.06
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN YO-NIEN;CHENG KUAN-LUAN;CHENG KUN-PI;CHEN HSIN-YUAN
分类号 G03F7/20;G06F7/00;G06F19/00;H01L21/00;(IPC1-7):G06F7/00 主分类号 G03F7/20
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