发明名称 |
Overlay registration control system and method employing multiple pilot lot in-line overlay registration measurement |
摘要 |
A method for fabricating a microelectronic product and a system for fabricating the microelectronic product each employ an in-line automatic photolithographic processing and overlay registration measurement for a pair of pilot lots of a new product order, prior to in-line automatic processing of an additional new product order lot within a photolithographic process tool. The method and the system provide for efficient production of new product order lots, absent need for an independent pilot lot qualification method or system.
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申请公布号 |
US6978191(B2) |
申请公布日期 |
2005.12.20 |
申请号 |
US20030656757 |
申请日期 |
2003.09.06 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN YO-NIEN;CHENG KUAN-LUAN;CHENG KUN-PI;CHEN HSIN-YUAN |
分类号 |
G03F7/20;G06F7/00;G06F19/00;H01L21/00;(IPC1-7):G06F7/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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