SINGLE METAL GATE MATERIAL CMOS USING STRAINED SI-SILICON GERMANIUM HETEROJUNCTION LAYERED SUBSTRATE
摘要
<p>Strained Si/strained SiGe dual-channel layer substrate provides mobility advantage and when used as a CMOS substrate enables single workfunction metal-gate electrode technology. A single metal electrode with workfunction of 4.5 eV produces near ideal CMOS performance on a dual-channel layer substrate that consists sequentially of a silicon wafer, an epitaxially grown 30% Ge relaxed SiGe layer, a compressively strained 60% Ge layer, and a tensile-strained Si cap layer.</p>
申请公布号
WO2005119762(A1)
申请公布日期
2005.12.15
申请号
WO2005US18514
申请日期
2005.05.26
申请人
MASSACHUSETTS INSTITUTE OF TECHNOLOGY;ANTONIADIS, DIMITRI, A.;HOYT, JUDY, L.;JUNG, JONGWAN;YU, SHAOFENG