| 摘要 |
A high density vertical three transistor memory cell is provided. The high density vertical three transistor memory cell is formed in a vertical pillar. The vertical pillar includes a first vertical transfer device having a source region, a drain region, and a body region therebetween on a first side of the vertical pillar. The vertical pillar also includes a second vertical transfer device having a source region, a drain region, and a body region therebetween on a second side of the vertical pillar. A write data wordline opposes the first vertical transfer device. A read data wordline opposes the second vertical transfer device. A storage capacitor is coupled to the drain region of the first vertical transfer device. The storage capacitor further serves as a gate for a third transistor.
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