| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position detection method capable of exactly detecting the position of a pattern of underlayer, by reducing the effects of an intermediate layer formed in-between the underlayer and a resist layer. <P>SOLUTION: The position detection method comprises an illumination process for illuminating a substrate where one or more intermediate layers are formed in between the underlayer including a pattern of the detection object and the resist layer; a fetching process for fetching a pattern image based on the lights L3' to L6' generated from each layer of the substrate, when it is illuminated by the illumination light; and a calculation process for calculating the pattern position, based on the image. In the illumination process, the spectral characteristics of the illumination light L1 is adjusted so that the intensity ratio, of "light L4' and light L5' from the middle layers 43, 44" vs "light L6' from the underlayer 41" among lights L3' to L6' generated from each layer of the substrate, becomes large, and the substrate is illuminated with the illumination light of the spectrum characteristic after adjustment. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
