| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase growth apparatus wherein the presence/absence of a susceptor for substrate arrangement to be inserted into and removed out of the reaction furnace on a turntable in the reaction furnace is sensed for preventing the collision of parts inside the reaction furnace, before a susceptor for substrate arrangement is set on the turntable. SOLUTION: The turntable 11 is provided in the reaction furnace of the vapor phase growth apparatus, the susceptor 2 for substrate arrangement is inserted into the reaction furnace from outside, and the susceptor 2 is placed on or suspended from the turntable 11. The vapor phase growth apparatus has a sensing means A for electrically sensing the presence/absence of a susceptor 2 for substrate arrangement on the turntable 11. COPYRIGHT: (C)2006,JPO&NCIPI |
