| 摘要 |
A positive resist composition includes a resin component (A) which contains an acid dissociable dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and a compound (C) represented by a general formula (1) shown below: <CHEM> wherein, each R1 group and each R3 group represents, independently, a hydrogen atom, an alkyl group of 1 to 3 carbon atoms, or a cycloalkyl group of 4 to 6 carbon atoms, provided at least one of the R1 and R3 groups is a cycloalkyl group of 4 to 6 carbon atoms, n represents an integer from 1 to 3, R2 represents an alkyl group of 1 to 3 carbon atoms, and X represents an alkylene group of either 4 or 5 carbon atoms.
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