发明名称 Apparatus for blanking a charged particle beam
摘要 Apparatus for blanking an electron or ion beam comprises a pair of blanking plates 2,3. A stopper 4 is mechanically and electrically connected to one blanking plate. By applying a suitable bias to the plates 2,3 and stopper 4, a beam 7 passing between the plates is deflected so that electrons or ions are stopped by the stopper 4. The stopper 4 may comprise a cavity 6 into which electrons or ions are deflected, the cavity 6 having a knife edge at its entrance. The cavity 6 may be formed by drilling a hole in the plate 2 from one face, chamfering the edge of the face and attaching a wedge to the chamfer to cover a part of the entrance of the hole. Alternatively, the cavity may be formed by drilling an angled hole from one face which stops a given distance form the opposite face, and then cutting a recess in the opposite face which breaks through to the hole.
申请公布号 GB2414857(A) 申请公布日期 2005.12.07
申请号 GB20040012428 申请日期 2004.06.03
申请人 * NANOBEAM LIMITED 发明人 TAO * ZHANG
分类号 G03F7/00;G21K1/087;H01J9/14;H01J37/04;H01J37/09;H01J37/147;H01J37/15 主分类号 G03F7/00
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