CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, (METH)ACRYLATE DERIVATIVE, AND PROCESS FOR PRODUCING SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist composition having performances such as resolution, sensitivity and a pattern feature suitable for ArF excimer laser lithography as well as showing preferable line edge roughness, and to provide a chemically amplified positive resist composition giving a finer pattern in a reflow process.

SOLUTION: The composition is a radiation-sensitive composition comprising the following resin and an acid generating agent. The resin contains a repeating unit expressed by formula (I) and at least one repeating unit selected from a group consisting of repeating units expressed by formulae (II) to (V). In formula (I), X represents a hydrogen atom, a 1-4C alkyl group or a 1-4C perfluoroalkyl group; Y represents a plurality of atoms necessary to complete an alicyclic hydrocarbon group with the carbon atom in the formula; Z represents a 1-12C bivalent hydrocarbon group; and R represents a 1-6C alkyl group or a 3-12C alicyclic hydrocarbon group.

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