发明名称 |
SURFACE MODIFICATION METHOD FOR SILICONE RESIN |
摘要 |
PROBLEM TO BE SOLVED: To provide a surface modification method for a silicone resin, whereby a biochip substrate which can be kept highly transparent even after the activation of its surface and is excellent in cost performance can be produced. SOLUTION: The surface modification method for the silicone resin comprises carrying out the ozone contact step of bringing ozone into contact with the surface of the silicone resin and carrying out the reducing agent contact step of bringing a reducing agent into contact with the surface of the resultant silicone resin. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2005330329(A) |
申请公布日期 |
2005.12.02 |
申请号 |
JP20040147993 |
申请日期 |
2004.05.18 |
申请人 |
KUBOTA CORP |
发明人 |
EZAKI SATOSHI;SHIRAIWA YUKI;KOWADA HIROMITSU;KURANE RYUICHIRO |
分类号 |
C12N15/09;C08J7/00;C12M1/00;(IPC1-7):C08J7/00 |
主分类号 |
C12N15/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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