发明名称 LITHOGRAPHIC APPARATUS, ARTICLE SUPPORT MEMBER AND METHOD THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus, an article support member and a method of manufacturing the article support member. <P>SOLUTION: The lithographic apparatus comprises a lighting system for offering a projection radiation beam, the article support member for supporting on an article support an article to be arranged on a beam path of the projection radiation beam, and a clamp for offering a clamped pressure for clamping the article to the article support during projection. The article support member is provided with a section which is trimmed for locally adjusting the clamped pressure. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005328045(A) 申请公布日期 2005.11.24
申请号 JP20050130909 申请日期 2005.04.28
申请人 ASML NETHERLANDS BV 发明人 ZAAL KOEN JACOBUS JOHANNES MARIA;VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES;OTTENS JOOST JEROEN
分类号 H01L21/683;G03B27/62;G03F7/20;H01L21/027;H01L21/68 主分类号 H01L21/683
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