发明名称 MEASURING INSTRUMENT FOR INSPECTING OBJECT OPTICALLY, AND OPERATION METHOD FOR MEASURING INSTRUMENT
摘要 PROBLEM TO BE SOLVED: To finely measure expanded structure, in particular, line structure, with a reduced measuring error, in a measuring instrument for inspecting an object optically and an operation method for the measuring instrument. SOLUTION: This measuring instrument is provided with means 14, 15 for imparting transition characteristics of continuous monotone functions to intensities of lights from light sources 6, 13, within a pupil face of an image focusing optical system 9 or an irradiation optical system 8, or within a plane of irradiation optical paths 4, 5 conjugated thereto or an image focusing optical path 11. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005326409(A) 申请公布日期 2005.11.24
申请号 JP20050137188 申请日期 2005.05.10
申请人 LEICA MICROSYSTEMS SEMICONDUCTOR GMBH 发明人 RINN KLAUS;DANNER LAMBERT
分类号 G01B11/00;G01B11/02;G01B11/03;G01B11/14;G01N21/88;G02B21/00;G02B27/02;G02B27/58;G03F7/20;H01L21/66;(IPC1-7):G01B11/00 主分类号 G01B11/00
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