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发明名称
A method for forming a mask pattern of a semiconductor device
摘要
申请公布号
KR100529623(B1)
申请公布日期
2005.11.17
申请号
KR20030098330
申请日期
2003.12.27
申请人
发明人
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
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