| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device in which a probe can be used both for observation and correction and which can perform desired processing without injuring a normal portion, even if a next generation photomask having a ultrafine structure is used as an object, in a step of acquiring information about the position and feature of a defect, or without damaging the probe during processing. <P>SOLUTION: During observation, the contact pressure between a probe 4 and a mask is reduced to 0.1 nN by applying vibration of 1 kHz to 1MHz on the probe 4. A cantilever 5 used in the present invention is made of a silicon material having 400 to 500 μm length and 30 to 50 μm thickness so that during observation, the probe 4 can be in contact with the mask under 1 nN contact pressure, and in processing, defect correction can be performed by allowing the probe to be in contact with the mask under 10 nN to 1mN contact pressure. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
