| 摘要 |
PROBLEM TO BE SOLVED: To provide a rinsing solution monitoring method, a system therefor, and a reagent therefor. SOLUTION: This rinsing solution monitoring method is a monitoring method for metal contamination in a rinsing solution. In the method, a sample of the rinsing solution is provided, the sample of the rinsing solution is mixed with the monitoring reagent to provide a monitoring mixture, and a characteristic of the monitoring mixture depending on a concentration of metal in the rinsing solution is measured thereafter, in particular, the characteristic of the monitoring mixture may be an absorbance of the monitoring mixture with respect to electromagnetic radiation transmitted through the monitoring mixture. The related systems and reagents are also disclosed. COPYRIGHT: (C)2006,JPO&NCIPI
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