发明名称 ERROR-DETECTING METHOD, ALIGNMENT METHOD, AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To search for detection errors, originating only with the characteristics of each mark detection system between two or more mark detection systems. <P>SOLUTION: While managing the position coordinate on the coordinate system at rest of a substrate W2, and the position coordinate on the coordinate system at rest of detection reference points SXa, SXb of mark detection systems 24a, 24b, the positional relation of the marks and the detection reference points of the mark detection systems formed on the substrate is detected respectively by the first mark detection system 24a and the second mark detection system 24b. Namely, the position coordinate on the coordinate system at rest of a mark, and furthermore, the position of the mark on the substrate are to be detected by each mark detection system. Thus, by comparing the position of the same mark formed on the same board, it is made possible to search for the detection error caused by only the characteristics of each mark detection system, without receiving the influence due to the substrate and marks. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005322755(A) 申请公布日期 2005.11.17
申请号 JP20040139100 申请日期 2004.05.07
申请人 NIKON CORP 发明人 YASUDA MASAHIKO
分类号 G03F9/00;H01L21/027 主分类号 G03F9/00
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