发明名称 Defect identification system and method for repairing killer defects in semiconductor devices
摘要 A method for improving semiconductor yield by in-line repair of defects during manufacturing comprises inspecting dies on a wafer after a selected layer is formed on the dies, identifying defects in each of the dies, classifying the identified defects as killer or non-critical, for each killer defect determining an action to correct the defect, repairing the defect and returning the wafer to a next process step. Also disclosed is a method for determining an efficient repair process by dividing the die into a grid and using analysis of the grid to find a least invasive repair.
申请公布号 US2005255611(A1) 申请公布日期 2005.11.17
申请号 US20040911142 申请日期 2004.08.04
申请人 PATTERSON OLIVER D;SHUTTLEWORTH DAVID M;ALBERS BRADLEY J;WECK WERNER;BROWN GREGORY 发明人 PATTERSON OLIVER D.;SHUTTLEWORTH DAVID M.;ALBERS BRADLEY J.;WECK WERNER;BROWN GREGORY
分类号 G01R31/26;G01R31/28;H01L21/66;H01L21/768;(IPC1-7):H01L21/66 主分类号 G01R31/26
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