| 发明名称 |
VISIBLE LIGHT PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition having sufficient sensitivity to visible light region, especially the 2nd harmonics of argon laser and YAG laser and forming excellent photosensitive layer for visible light lasers. <P>SOLUTION: The visible light photosensitive resin composition comprises a coumarin compound represented by a compound of formula(44) and a titanocene compound. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2005320338(A) |
申请公布日期 |
2005.11.17 |
| 申请号 |
JP20050148984 |
申请日期 |
2005.05.23 |
| 申请人 |
MITSUI CHEMICALS INC |
发明人 |
SUZUKI RIHOKO;OTSUJI ATSUO;URAGAMI TATSUNOBU;TAKUMA HIROSUKE |
| 分类号 |
G03F7/004;C07D405/06;C07D413/06;C07D417/06;C07D491/052;C07D491/16;C08F2/50;G03F7/029 |
主分类号 |
G03F7/004 |
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