发明名称 Exposure device
摘要 A laser exposure device at which alignment marks of a plate material on an exposure stage, which is moving in a direction opposite to a scanning direction, are read by a CCD camera mounted at a support gate, after which an imaging region, whose position is judged using the alignment marks, is exposed by a laser beam from a laser scanner. Here, a distance along the scanning direction from the CCD camera to the laser scanner is not less than a pitch of the alignment marks that are provided to respectively correspond to a trailing end and a leading end of the imaging region. According to this laser exposure device, even in a case in which a plurality of the imaging region is provided at a recording medium, an increase in a duration for forming images on the recording medium in accordance with an increase in imaging regions is prevented.
申请公布号 US2005254032(A1) 申请公布日期 2005.11.17
申请号 US20050132210 申请日期 2005.05.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OZAKI TAKAO;WADA KOJI
分类号 G03B27/52;G03F9/00;H05K1/02;H05K3/00;(IPC1-7):G03B27/52 主分类号 G03B27/52
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