| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a projection aligner on which mounted with an interferometer capable of measuring optical performances such as wavefront aberration and curvature of field of a projection optical system which projects a pattern on a reticle surface onto a wafer surface. <P>SOLUTION: The device is provided with an illuminating system for illuminating a first object with an exposing light from an exposing light source, the projection optical system for projecting the pattern of the first object onto a second object, and the interferometer for measuring the optical characteristics of the projection optical system utilizing the exposing light. The interferometer divides the exposing light that has passed through the projection optical system to two beams of light and allows the two divided beams of light to be interfered with each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
