APPARATUS, METHOD AND PROGRAM PRODUCT FOR SUPPRESSING WAVINESS OF FEATURES TO BE PRINTED BY USING PHOTOLITHOGRAPHIC SYSTEMS

摘要

PROBLEM TO BE SOLVED: To provide a method for minimizing variation of features when imaged on a surface of a substrate by using a mask.

SOLUTION: The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.

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