| 摘要 |
PROBLEM TO BE SOLVED: To measure the registration precision of a resist pattern to a reference layer (a resist pattern formed through a thin film on the reference layer) with high precision. SOLUTION: A registration precision measurement mark is constituted of a reference mark 10 and an overlap mark 20. Dummy patterns (patterns which are not used for measurement) 3 and 4 are formed inside and outside the reference pattern 11 as the reference mark 10. Then, the projecting part of a thin film formed at the upper part of the reference pattern 11 is considered as a reference pattern, and intervals x1 and x2 between the outside line of the reference pattern 11 and the inside line of a registration pattern 21 corresponding to this are measured. |
