Process and apparatus for pattern detection on a substrate

摘要

The device has a telecentric optical measurement system (10), and light sources (4, 5) respectively issuing incident beams (I1, I2). The incident beams (I1, I2) respectively traverse a telecentric display system (15) and an oblique display system (25). An optical sensor (13) receives beams reflected by a substrate (2). The system (10) has an optical system (11) traversed by the incident beams and the reflected beams. An independent claim is also included for a method for detecting pattern or splice on a substrate.