发明名称 Scanning exposure apparatus and device manufacturing method
摘要 A scanning exposure apparatus includes a surface position adjuster for adjusting the surface position of an object with respect to an image plane of a projection optical system, on the basis of a detection by the surface position detector in the projection, a controller for controlling a moving system and the surface position detector to perform a pre-scan measurement of the surface position of the object, prior to the projection, so as to detect an error, related to the detection through the surface position detector, with respect to each of detection points, which error is attributable to a difference in pattern structure at the detection points in the region, the detected error being used for correcting the adjustment by the surface position adjuster in the projection, and an initializing device for initializing the surface position detector in synchronism with the scan motion and the projection, at the position where the surface position detector has started the detection in the pre-scan measurement.
申请公布号 US6963075(B2) 申请公布日期 2005.11.08
申请号 US20010024139 申请日期 2001.12.21
申请人 CANON KABUSHIKI KAISHA 发明人 YAMADA YUICHI;UZAWA SHIGEYUKI
分类号 G03F7/20;G03F9/00;(IPC1-7):G01N21/86 主分类号 G03F7/20
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