发明名称 A THIN FILM SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A THIN FILM SEMICONDUCTOR DEVICE
摘要 <p>A thin film semiconductor in the form of a metal semiconductor field effect transistor, includes a substrate 10 of paper sheet material and a number of thin film active inorganic layers that are deposited in layers on the substrate. The active layers are printed using an offset lithography printing process. A first active layer comprises source 12.1 and drain 12.2 conductors of colloidal silver ink, that are printed directly onto the paper substrate. A second active layer is an intrinsic semiconductor layer 14 of colloidal nanocrystalline silicon ink which is printed onto the first layer. A third active layer comprises a metallic conductor 16 of colloidal silver which is printed onto the second layer to form a gate electrode. This invention extends to other thin film semiconductors such as photovoltaic cells and to a method of manufacturing semiconductors.</p>
申请公布号 EP1593163(A2) 申请公布日期 2005.11.09
申请号 EP20040706753 申请日期 2004.01.30
申请人 UNIVERSITY OF CAPE TOWN 发明人 HARTING, MARGIT;BRITTON, DAVID THOMAS
分类号 H01L29/812;H01L21/20;H01L21/208;H01L21/336;H01L21/338;H01L27/142;H01L29/49;H01L31/0224;H01L31/0392;H01L31/20;H05K1/03;H05K3/10;(IPC1-7):H01L29/786;H01L21/28 主分类号 H01L29/812
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