| 摘要 |
To provide an etching method capable of uniformly etching a glass surface by allowing uniform contact of an etchant to the glass surface, and an apparatus using the method. In an inventive etching method, an etchant is sprayed on a surface of a glass plate, after which the etchant is removed to thereby accomplish etching of the glass plate. At this time, it is preferred that the etchant is sprayed on a bottom surface of a horizontally held glass plate. An inventive etching apparatus includes a supporting member for supporting a glass plate, a nozzle for spraying an etchant to a glass surface and an etchant reservoir for reserving the etchant. In this apparatus, the supporting member preferably supports a glass plate in a horizontal state, and the nozzle is preferably disposed so as to be able to spray an etchant on a bottom surface of the glass plate supported horizontally. |
