IMMERSION TYPE LITHOGRAPHY METHOD UTILIZING IMMERSION FLUID WITH HIGH ACID ALKALI VALUE AND ITS SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a method and a system which implement an immersion type optical lithography technique.

SOLUTION: At least one objective lens 304 is placed at an upper part of a substrate in which a photoresist 306 is provided. The objective lens 304 transmits predetermined radiation to the substrate on which the photoresist 306 is provided. A liquid is filled between the substrate and the objective lens 304. The liquid makes direct contact with the objective lens 304 and the photoresist 306 provided on the substrate, and the liquid includes hydroxyl ion with mol concentration higher than 10-7mol/liter.

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