发明名称 |
Exposure apparatus, device manufacturing method, pattern generator and maintenance method |
摘要 |
An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.
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申请公布号 |
US2005237375(A1) |
申请公布日期 |
2005.10.27 |
申请号 |
US20050112695 |
申请日期 |
2005.04.21 |
申请人 |
TOKITA TOSHINOBU;OTA HIROHISA;KAWAKAMI EIGO;NAKAMURA TAKASHI;KASUMI KAZUYUKI |
发明人 |
TOKITA TOSHINOBU;OTA HIROHISA;KAWAKAMI EIGO;NAKAMURA TAKASHI;KASUMI KAZUYUKI |
分类号 |
G02F1/13;B41J29/38;G03F7/20;H01L21/027;(IPC1-7):B41J29/38 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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