METHOD FOR FORMING A CONTACT HOLE IN A SEMICONDUCTOR DEVICE,申请号KR20020086347-传众专利搜索

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发明名称	METHOD FOR FORMING A CONTACT HOLE IN A SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100523618(B1)	申请公布日期	2005.10.24
申请号	KR20020086347	申请日期	2002.12.30
申请人		发明人
分类号	H01L21/28;H01L21/425;H01L21/44;H01L21/4763;H01L21/768;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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