发明名称 HIGH CRITICAL FACE CURRENT SUPERCONDUCTING OXIDE THIN FILM ON SAPPHIRE SUBSTRATE AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high critical face current superconducting oxide thin film by producing a relatively thick (RE)Ba<SB>2</SB>Cu<SB>3</SB>O<SB>7</SB>(wherein, RE is one kind of atom selected from Y, Nd, Sm, Eu, Gd, Dy, Ho, Er and Yb) äobviated as (RE)BCO} having high critical current density on a sapphire substrate without generating cracks, and to provide its production method. SOLUTION: The high critical face current superconducting oxide thin film is obtained, using an off-cut substrate cut and polished in a state of intentionally shifted by several degrees from the R face (1102) or the A face (1120) of sapphire single crystals, by producing a buffer layer on the substrate, and producing an (RE)BCO thin film thereon. The production method uses the same. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005290528(A) 申请公布日期 2005.10.20
申请号 JP20040111564 申请日期 2004.04.05
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 NIE JIACAI;YAMAZAKI HIROFUMI
分类号 C01G1/00;C01G3/00;C23C14/08;C30B29/22;H01L39/24;(IPC1-7):C23C14/08 主分类号 C01G1/00
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