FILM FORMING APPARATUS AND FILM FORMING METHOD

摘要

An optical film having a thin film stacked and optical characteristics close to design values is provided. In a vacuum chamber (2), a rotating drum (3) holding a board (4), an Si target (22) for forming a metal film on a film forming plane of the board (4), a Ta target (23), and an ECR reaction chamber (30) for reacting the metal film to a reaction gas by plasma, are provided. A film forming apparatus (51) is provided with an ion gun (11) for accelerating reaction of the film formed on the film forming plane by irradiating the film forming plane with ion beams, and the metal film formation, the gas reaction and the reaction acceleration by using ion beams are repeatedly performed.