| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a charged particle beam transfer mask at a high productivity and a mask manufactured thereby; the mask having a stencil mask structure having a transferring pattern of holes formed in a conductive thin film layer. <P>SOLUTION: The method has a process of forming a conductive thin film layer on one main surface of a quartz glass substrate, a process of back facing the opposite side of the quartz glass substrate to the thin film layer to form a thin-walled portion of the substrate, processes f, g of etching the thin film layer to form through-holes through the thin film layer like a transferring pattern, a process h of forming a girder resist pattern on the thin-walled portion a step i of sand-blasting this walled portion to make further thin, a process of wet etching and removing the thinned thin-wall portion to form a girder of quartz glass, and a process j of forming windows for passing a charged particle beam through charged particle beam pass holes so as to contribute to the transfer. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
