SUPER-RESOLUTION NEAR-FIELD STRUCTURE AND SUPER-RESOLUTION NEAR-FIELD EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To perform reliable exposure of a photoresist layer with near-field light without thermally damaging the photoresist layer.

SOLUTION: A photoresist layer 22 and a photochromic layer 24 are sequentially formed on a prescribed substrate 21. The photochromic layer 24 is irradiated with a first laser beam 27, whereby the photochromic layer 24 is made partially transparent to form an opening 28. Near-field light 29 is then generated by irradiating the opening 28 of the photochromic layer 24 with a second laser beam 37 and the photoresist layer 22 is exposed with the near-field light 29.

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